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High Temperature Processes in Silicon Solar Cells Production
Frantík, Ondřej ; Hudec, Lubomír (referee) ; Banský,, Juraj (referee) ; Szendiuch, Ivan (advisor)
The thesis is focused on high temperature processes in crystalline solar cells production. Main topic is diffusion of traditional dopants phosphorus and boron. Diffusion processes for creating solar cells are different from classical diffusion in semiconductor industrial. It is reason why the thesis describes crated layers in detail. Knowledge of diffusion processes is used for creating bifacial solar cells and development of a new phosphorus emitter for conventional solar cells. Bifacial cells are a new type of cells. Developed new emitter increases efficiency and decreases cost of solar cells production. Another part the thesis is devoted to the prediction of diffusion processes. New models of phosphorus and boron diffusion for photovoltaic industrial are created in software SILVACO. Models correspond with real results.
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Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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Thin Film Electrodes for Electrochromic Devices
Macalík, Michal ; Kadlec, Jaromír (referee) ; Nováková,, Sabina (referee) ; Sedlaříková, Marie (advisor)
The work deals with the deposition of layers for electrochromic device with different methods. Transparent electrically conductive layer of SnO2 was deposited by pyrolytic decomposition of peroxostannate solution. Hydrogen peroxide in starting solution contributes to the oxidation process of growth layers and to increase the electrical conductivity. Active electrochromic layer of WO3 was electrolytic deposited from the peroxotungstic acid solution. Optimal deposition time and the optimal annealing temperature of deposited layers were found. Passive electrochromic layer of V2O5 was deposited using dip-coating method from peroxovanadate solution. A contribution of solution diluted with distilled water was investigated. Found results were used to construct complete electrochromic device with polymer gel electrolyte.
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Fabrication of conducting patterns by material electroless plating of printed precursor
Kováčová, Silvia ; Gemeiner,, Pavol (referee) ; Dzik, Petr (advisor)
The subject of this diploma thesis is the preparation of conductive structures by electroless plating of an extruded precursor. The experimental part deals with the preparation of standard patterns based on the length of immersion time in a coppering bath. The precursor layers were applied with Fujifilm Dimatix to various receiver substrates. The individual substrates with the precursor layer were immersed in the copper solution within different time intervals. The structure of the layers of grown copper and their thickness was characterized by a profilometer.
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Fabrication of conductive paths by electroless plating of printed precursors
Kováčová, Silvia ; Zita, Jiří (referee) ; Dzik, Petr (advisor)
The subject of this bachelor thesis is the preparation of conductive tracks by electroless plating of printed precursors. The experimental part deals with the preparation of standard samples based on the length of immersion time in the coppering bath. The precursor layers were applied with a technical pen to ceramic corundum substrates. The individual precursor layer substrates were immersed in the coppering bath in various time intervals. The structure of the grown copper layers was observed by an optical microscope and their thickness was determined by a profilometer.
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Experimental Investigation of Integrated Thick Films
Čejka, Marek ; Jankovský, Jaroslav (referee) ; Szendiuch, Ivan (advisor)
This bachelor thesis deals with the theory of thick film technology. It describes implementation of thick layer integrated circuits, thick film technology, creen printing method. It includes basic electrical properties of thick layers. The aim of this work is the experimental work deals with the detection of current rating of conductors. The work includes the design of method of measuring and test structure.
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Electrical properties of thick film pastes measured in a wide temperature range
Gajdoš, Jiří ; Jankovský, Jaroslav (referee) ; Řezníček, Michal (advisor)
The aim of this master’s thesis is to investigate the electrical properties of various thick-film resistor pastes in a wider temperature range. The thesis mainly focuses on a change in electrical resistance depending on temperatures, which extend to the cryogenic region. To achieve this, there is an overview of the thick-film technology properties, major technological procedures, principles of resistive pastes conductivity, methods of electrical resistance measuring, possible errors in measurement and methods of their minimization. The content of this work is also familiar with the characteristics of a cryogenic station, on this foundation was proposed the measurement procedure and created thick-film circuits for this station. After measurement in the interval 10 K to 350 K, there are subsequently evaluated the data and explains the principles of the conductivity of used pastes.
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Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications
Jarušek, Jaromír ; Chmela, Ondřej (referee) ; Gablech, Imrich (advisor)
In this work, nitride layers, their applications in bioelectronics, and methods of chemical vapour deposition and physical vapour deposition are presented. The focus of this work is the preparation of titanium nitride thin films by reactive sputtering using Kaufman ion-beam sources. Thin films were deposited on silicon wafers and microslides. Deposited titanium nitride thin films are characterized by X-ray diffraction, four-point probe sheet resistance measurement and profilometry to determine residual stress.
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Fabrication of conducting patterns by material electroless plating of printed precursor
Kováčová, Silvia ; Gemeiner,, Pavol (referee) ; Dzik, Petr (advisor)
The subject of this diploma thesis is the preparation of conductive structures by electroless plating of an extruded precursor. The experimental part deals with the preparation of standard patterns based on the length of immersion time in a coppering bath. The precursor layers were applied with Fujifilm Dimatix to various receiver substrates. The individual substrates with the precursor layer were immersed in the copper solution within different time intervals. The structure of the layers of grown copper and their thickness was characterized by a profilometer.
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Fabrication of conductive paths by electroless plating of printed precursors
Kováčová, Silvia ; Zita, Jiří (referee) ; Dzik, Petr (advisor)
The subject of this bachelor thesis is the preparation of conductive tracks by electroless plating of printed precursors. The experimental part deals with the preparation of standard samples based on the length of immersion time in the coppering bath. The precursor layers were applied with a technical pen to ceramic corundum substrates. The individual precursor layer substrates were immersed in the coppering bath in various time intervals. The structure of the grown copper layers was observed by an optical microscope and their thickness was determined by a profilometer.
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